Equipped with thin-film technology, the Accu-P® is a high frequency capacitor exhibiting truly ideal characteristics. Thin-film technology is commonly used in producing semiconductor devices. In the last two decades, this technology has developed tremendously, both in performance and in process control. Today’s techniques enable line definitions of below 1μm, and the controlling of thickness of layers at 100Å (10-2μm). Applying this technology to the manufacture of capacitors has enabled the development of components where both electrical and physical properties can be tightly controlled.
The Accu-L® inductor is particularly suited for the wireless industry where there is a continuing trend towards miniaturization and increasing frequencies. The Accu-L® inductor meets both the performance and tolerance requirements of All cellular frequencies . Thin film inductors featuring extreme lot-to-lot repeatability and tight tolerance. The use of very low-loss dielectric materials, silicon dioxide and silicon oxynitride, in conjunction with highly conductive electrode metals results in low ESR and high Q. These high-frequency characteristics change at a slower rate with increasing frequency than for ceramic microwave inductors. Because of the thin-film technology, the above-mentioned frequency characteristics are obtained without significant compromise of properties required for surface mounting.